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德国海德堡 MLA150无掩膜激光直写光刻机
MLA150是一款专为研发及中小批量生产设计的无掩膜激光直写机，能够直接将设计图形曝光至光刻胶涂层的基材上，具备灵活修改图形结构的优势，适用于生命科学、MEMS、微光学等领域。
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海德堡 HEIDELBERG INSTRUMENTS
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- 产品描述
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MLA150是一款专为研发及中小批量生产设计的无掩膜激光直写机，能够直接将设计图形曝光至光刻胶涂层的基材上，具备灵活修改图形结构的优势，适用于生命科学、MEMS、微光学等领域。
High Speed, High Precision, No Compromises
User-friendly doesn’t mean lower performance. The MLA 150 delivers the speed and accuracy you need to push the boundaries of fabrication.
- Sub-Micron Resolution: Achieve a minimum feature size down to 0.45 μm to create complex, high-resolution devices.
- Outstanding Throughput: Expose a full 150 mm wafer in less than 16 minutes.
- Advanced Automated Alignment: The system achieves 250 nm alignment accuracy and digitally compensates for offset, rotation, scaling, and shearing—adjustments impossible with physical masks.
- Perfect Focus: A dynamic autofocus system ensures sharp, uniform features, effectively handling patterned, warped, or delicate substrates.
- Ultimate Stability: An integrated environmental chamber with temperature-controlled laminar airflow (±0.1°C) minimizes thermal expansion effects, ensuring stable and repeatable results.
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